Overview of Copper Plate

A copper plate is a flat sheet made from copper or copper alloys, widely used in various industries including electrical, construction, and decorative arts. Known for its excellent conductivity, corrosion resistance, and aesthetic appeal, copper plates are versatile materials suited for numerous applications.

Features of Copper Plate

High Electrical Conductivity: Exceptional ability to conduct electricity, making it ideal for electrical components.

Corrosion Resistance: Resists corrosion and oxidation, ensuring long-lasting performance.

Thermal Conductivity: Efficient in conducting heat, useful in heat exchangers and cookware.

Malleability and Ductility: Can be easily shaped into complex forms without breaking.

Antimicrobial Properties: Naturally resists bacterial growth, beneficial in medical and food industries.

Aesthetic Appeal: Offers a unique color and finish, enhancing architectural and artistic projects.

Specifications of PVD target Ta2O5 disc Tantalum pentoxide sputtering target with copper backing plate

Product Specifications: Ta Two O ₅ Sputtering Target with Copper Support Plate

Product Composition

This sputtering target includes a high-purity tantalum pentoxide (Ta ₂ O ₅) disc bound to a oxygen-free copper support plate . The Ta two O five layer meets or goes beyond 99.95% pureness , making certain constant thin-film efficiency. The copper backing gives excellent thermal conductivity and mechanical support during the sputtering process.

Physical Measurements

The standard disc diameter is 2 inches (50.8 mm), 3 inches (76.2 mm), or 4 inches (101.6 mm), with customized sizes offered upon demand. The common thickness of the Ta two O ₅ layer arrays from 3 mm to 6 mm , while the copper backing plate is normally 3 mm thick . Overall setting up density falls in between 6 mm and 9 mm , depending on setup.

Bonding Quality

The Ta ₂ O five ceramic disc is safely bound to the copper plate making use of high-temperature brazing or indium bonding , based on consumer requirements. This bond ensures strong attachment, minimizes thermal stress, and avoids delamination under high-power sputtering problems. All bonded targets go through ultrasonic inspection to verify joint honesty.

Surface area End up

The sputtering surface area is ground and refined to a smooth finish, typically with a surface area roughness of Ra ≤ 0.8 μm . Edges are chamfered to minimize flaking and fragment generation. The backside continues to be clean and flat for ideal call with the sputtering cathode.

Product packaging and Handling

Each target is cleaned in a regulated environment and vacuum-sealed in anti-static product packaging. It consists of desiccant to prevent dampness absorption. Targets are labeled clearly with material type, dimensions, batch number, and positioning marks for very easy installation.

Applications

These Ta Two O FIVE/ Cu sputtering targets are commonly utilized in the manufacturing of optical finishes, dielectric layers in semiconductors, and capacitors. Their stable structure and reputable bonding make them perfect for high-precision thin-film deposition systems.

Applications of PVD target Ta2O5 disc Tantalum pentoxide sputtering target with copper backing plate

Applications of PVD Target: Ta Two O ₅ Disc with Copper Support Plate

High-Performance Optical Coatings

Tantalum pentoxide (Ta ₂ O FIVE) sputtering targets are widely used to make optical slim films. These movies enter into anti-reflective finishings, mirrors, and interference filters. The product uses superb refractive index stability and reduced absorption in visible and near-infrared light varieties. With a copper support plate, the target bonds well to the sputtering fixture, guaranteeing even heat circulation and constant film top quality throughout lengthy deposition runs.

Advanced Semiconductor Manufacturing

In semiconductor manufacturing, Ta two O five acts as a high-k dielectric layer in capacitors and gate insulators. Its high dielectric constant helps in reducing leakage current while maintaining tool efficiency. The copper support enhances thermal conductivity, which is vital when dealing with sensitive microelectronic parts. This configuration supports stable, repeatable sputtering– essential for automation atmospheres.

Long Lasting Protective Layers

Ta two O five coatings also act as difficult, chemically inert obstacles on accuracy instruments and clinical tools. They withstand wear, deterioration, and high temperatures. The copper support plate enhances mechanical support and cooling down efficiency during the physical vapor deposition (PVD) procedure. This mix allows makers to use uniform, dense movies without breaking or delamination.

Dependable Efficiency Throughout Industries

From aerospace sensors to consumer electronic devices, Ta two O five sputtering targets with copper support supply trustworthy results. The copper backing ensures strong adhesion to the sputtering cathode and decreases thermal stress. This layout minimizes downtime and extends target life. Users improve material usage and fewer procedure interruptions.

These targets fulfill stringent purity and density requirements, making them ideal for research study labs and industrial-scale coating systems alike. Their durable building sustains both DC and RF sputtering methods.

Company Introduction

Welcome to Wgraj, a premier global supplier of high-quality metal cladding solutions. We specialize in providing a wide range of metal cladding products, including aluminum, steel, and copper composites, designed to meet the diverse needs of architects, builders, and designers. Our commitment to innovation, durability, and aesthetic excellence ensures that our clients receive top-tier materials for their projects. With state-of-the-art manufacturing facilities and a dedication to customer satisfaction, we deliver reliable, cost-effective solutions worldwide. Partner with us for your metal cladding needs and experience unmatched quality and service.

If you have any questions, please feel free to contact us(nanotrun@yahoo.com).

Payment Methods

T/T, Western Union, Paypal, Credit Card etc.

Shipment Methods

By air, by sea, by express, as customers request.

5 FAQs of PVD target Ta2O5 disc Tantalum pentoxide sputtering target with copper backing plate

Frequently Asked Questions About Ta₂O₅ Sputtering Targets with Copper Backing Plate

What is a Ta₂O₅ sputtering target?

A Ta₂O₅ sputtering target is a disc made of tantalum pentoxide. It is used in physical vapor deposition (PVD) to create thin films. These films are common in optical coatings, semiconductor devices, and capacitors.

Why is there a copper backing plate?

The copper backing plate helps with heat conduction. During sputtering, the target gets hot. Copper moves heat away fast. This keeps the target stable and prevents damage. The backing also makes mounting easier in sputtering systems.

What purity level do you offer?

Our standard Ta₂O₅ targets have 99.95% purity. Higher purity options like 99.99% are available on request. High purity reduces defects in the final film. It also improves performance in sensitive applications.

How is the bond between Ta₂O₅ and copper made?

We use high-temperature bonding methods. This creates a strong, reliable joint. Good bonding stops delamination during use. It also ensures even cooling across the whole target surface.

Can I get custom sizes or shapes?

Yes. We offer standard disc sizes. We also make custom diameters, thicknesses, and shapes. Just share your machine specs or process needs. We will match the target to your system for best results.