Metal Alloy High Purity Titanium Sputtering Target

About Metal Alloy High Purity Titanium Sputtering Target:Standard:ASTM B265, ASME SB265, ASTM F67, ASTM F136, AMS 4902, AMS 4911Properties:Titanium sputtering target is made of titanium metal, which i...…

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Lanthanum Nitride LaN Powder CAS 25764-10-7

Item No.: Tr-LaN Lanthanum nitride is known as LaN powder. Lanthanum nitride LaN powder is used in high-end electronics, sputtering targets, ceramic materials, magnetic materials, semiconductor materials.Purity: 99.9%Particle Size: -100 mesh…

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